CORDIS Project
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This project focuses on advancing Mask-Less Lithography (ML2) technology to improve semiconductor manufacturing processes. By developing a cost-effective and high-resolution alternative to traditional lithography, it aims to meet the evolving needs of the industry.
In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now the driving solution to deal with all industry concerns.
Nevertheless, this solution becomes less effective for each new technology node.
Effectively, it requires more and more complex and expensive masks due to the introduction of optical proximity correction and phase shift techniques.
The blow up of the tool price plays also an important role in the overall cost of ownership of this technique.
Thi…
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Partner organizations (coordinator is shown above), with normalized type and CORDIS activity type. Guests see up to 4 partners.
Austria, Dornbirn
Type: University / higher education
Activity type: Higher or Secondary Education Establishments
SME: No
Austria, WIEN
Type: Company (for-profit)
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
Belgium, Seneffe
Type: Company (for-profit)
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
SME: No
Belgium, ZWIJNDRECHT
Type: Company (for-profit)
Activity type: Private for-profit entities (excluding Higher or Secondary Education Establishments)
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