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The MOORELIGHT project aims to enhance the efficiency of extreme ultraviolet lithography by developing solid-state laser technologies. It focuses on understanding the physics of laser interactions with tin targets to improve the production of EUV light for semiconductor manufacturing.
Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength.
This small wavelength enables patterning the smallest and smartest features on chips.
The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin…
STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN
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