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The NADIA project focuses on developing Area Selective Deposition (ASD) techniques for nanoscale material patterning in semiconductor manufacturing. This innovative approach aims to enhance deposition control while minimizing the need for complex and costly lithographic processes.
The need for area selective deposition (ASD):
Nanoscale patterning of materials is becoming a key issue for a broad range of devices, especiallyin the back end of line (BEOL).
With the introduction of Intel’s latest 10nm node earlier this year, it is vital to develop new ways to master selectivedeposition of materials at the nanoscale, preferably without the use of lithographic and etching steps, as they can be time-consuming, expensiveand mainly subtractive processes.
Novel concepts are thus ne…
INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM
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