CORDIS Project
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This project focuses on enhancing two-photon direct laser writing lithography to create nanometer-scale 3D structures for the microelectronics industry. By employing a two-beam approach, it aims to improve feature size and spatial resolution, addressing current limitations in nanofabrication techniques.
Two-photon direct laser writing (DLW) lithography is a powerful tool to fabricate 3D structures with feature sizes of ~100 nm.
This technique is based on the quadratic dependence of the absorption of near-infrared (NIR) light (two-photon absorption, 2PA) by molecules called photoinitiators which trigger the photopolymerization of curable resins.
With the aim of downsizing the structures to the nanometer resolution, a requirement of the microelectronics industry, a new strategy has been added to…
FONDAZIONE ISTITUTO ITALIANO DI TECNOLOGIA
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