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The Extreme Ultraviolet Ptychographic Microscopy project aims to enhance imaging techniques using extreme ultraviolet light. By developing structured illumination methods, it seeks to improve resolution and robustness for applications in imaging science, particularly for advanced materials and quantum devices.
This project “Extreme ultraviolet ptychographic microscopy” (XUVPM) aims at improving the robustness and resolution of multispectral extreme ultraviolet (XUV) ptychography by realizing novel types of high divergence structured illumination in XUV spectral range.
In this microscope, two-color generation of high-order harmonics from an industrial grade femtosecond laser will be employed to create structured illumination with controllable degree of orbital angular momentum (OAM) to be combined with…
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